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ION BEAM DELAYERING SYSTEM AND METHOD, TOPOGRAPHICALLY ENHANCED DELAYERED SAMPLE PRODUCED THEREBY, AND IMAGING METHODS AND SYSTEMS RELATED THERETO
ION BEAM DELAYERING SYSTEM AND METHOD, TOPOGRAPHICALLY ENHANCED DELAYERED SAMPLE PRODUCED THEREBY, AND IMAGING METHODS AND SYSTEMS RELATED THERETO
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机译:离子束延迟系统和方法,由此产生的层析增强延迟样品,以及与其相关的成像方法和系统
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摘要
Described are various embodiments of an ion beam delayering system and method, topographically enhanced sample produced thereby, and imaging methods and systems related thereto. In one embodiment, a method comprises: identifying at least two materials in an exposed surface of the sample and predetermined operational characteristics of an ion beam mill that correspond with a substantially different ion beam mill removal rate for at least one of the materials; operating the ion beam mill in accordance with the predetermined operational characteristics to simultaneously remove the materials and introduce or enhance a topography associated with the materials and surface features defined thereby; acquiring surface data; and repeating the operating and acquiring steps for at least one more layer.
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