首页> 外国专利> LEAK SOURCE SPECIFICATION ASSISTANCE DEVICE, LEAK SOURCE SPECIFICATION ASSISTANCE METHOD, AND LEAK SOURCE SPECIFICATION ASSISTANCE PROGRAM

LEAK SOURCE SPECIFICATION ASSISTANCE DEVICE, LEAK SOURCE SPECIFICATION ASSISTANCE METHOD, AND LEAK SOURCE SPECIFICATION ASSISTANCE PROGRAM

机译:泄漏源指定辅助装置,泄漏源指定辅助方法和泄漏源指定辅助程序

摘要

A leak source specification assistance device that comprises a processing part that: performs processing that, on the basis of the movement of a first pixel that is one of the pixels that constitute an image that includes a leaked fluid region (a gas region), determines a second pixel that is one of the pixels that constitute the image and is a movement origin pixel for the first pixel; and determines a final movement origin pixel by repeating the processing using the second pixel as a new first pixel. The processing part determines a final movement origin pixel for each of the plurality of pixels that constitute the image by repeating the processing for each of the plurality of pixels.
机译:泄漏源指定辅助装置,其具有处理部,该处理部基于构成作为包含泄漏的流体区域(气体区域)的图像的像素之一的第一像素的移动,进行确定的处理。第二像素是构成图像的像素之一,并且是第一像素的运动原点像素;并且通过重复使用第二像素作为新的第一像素的处理来确定最终运动原点像素。处理部通过对多个像素中的每个像素重复处理,来确定构成图像的多个像素中的每个像素的最终运动原点像素。

著录项

  • 公开/公告号WO2020110410A1

    专利类型

  • 公开/公告日2020-06-04

    原文格式PDF

  • 申请/专利权人 KONICA MINOLTA INC.;

    申请/专利号WO2019JP35311

  • 发明设计人 ASANO MOTOHIRO;

    申请日2019-09-09

  • 分类号G01M3/02;G01M3/38;

  • 国家 WO

  • 入库时间 2022-08-21 11:10:54

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