METHOD FOR PROCESSING A TEMPERED GLASS FILM, AND CORRESPONDING TEMPERED GLASS FILM

摘要

A method (10) for processing a tempered glass film comprising a layer of tempered glass, at least one layer of titanium oxide, and at least one layer of silicon oxide, in order starting from the layer of tempered glass, which comprises the steps of: - bringing (12) the layer of tempered glass to a high vacuum pressure comprised between 0.7E-5 millibars and 1.7E-5 millibars; - heating (14) the layer of tempered glass to a temperature comprised between 50°C and 70°C; - striking (16) the layer of tempered glass with an ion discharge for a length of time comprised between 150 seconds and 210 seconds; - depositing (18) the at least one layer of titanium oxide and the at least one layer of silicon oxide on the layer of tempered glass, the at least one layer of titanium oxide being interposed between the layer of tempered glass and the at least one layer of silicon oxide, thereby obtaining the tempered glass film; and - cooling (22) the tempered glass film down to ambient temperature; wherein the layer of tempered glass has a thickness comprised between 0.1 millimeters and 0.5 millimeters, each of the at least one layer of titanium oxide has a thickness comprised between 10.00 nanometers and 200.00 nanometers, and each of the at least one layer of silicon oxide having a thickness comprised between 20.00 nanometers and 220.00 nanometers.