首页> 外国专利> METHOD FOR QUANTITATIVELY MEASURING CONTENT OF THIOL LIGAND ON QUANTUM DOT SURFACE

METHOD FOR QUANTITATIVELY MEASURING CONTENT OF THIOL LIGAND ON QUANTUM DOT SURFACE

机译:量子点表面硫醇含量的定量测定方法

摘要

A method for quantitatively measuring a content of a thiol ligand on a quantum dot surface. Bismuth vanadate (BiVO4) is a visible light responding semiconductor material, has a good photocatalytic activity, and also has a good photoelectric property. Photoelectrochemical (PEC) test is performed, during illumination, an electron hole in a ground state is separated, and it is detected that transited electrons can generate a current. Bismuth sulfide (Bi2S3), as a semiconductor material, can form a Bi2S3-BiVO4 heterojunction with the bismuth vanadate; such Bi2S3-BiVO4 heterojunction can improve the separation efficiency of the hole and the electron, and has a larger current strength than BiVO4 when performing PEC test. A proportion of the bismuth sulfide and the bismuth vanadate is within a certain range; the content of Bi2S3 is proportional to a size of a photocurrent; and by testing the size of the photocurrent, quantitative calculation of Bi2S3 can be implemented, i.e., the content of the thiol ligand on the quantum dot surface is obtained.
机译:一种定量测量量子点表面上硫醇配体含量的方法。钒酸铋(BiVO 4 )是一种可见光响应的半导体材料,具有良好的光催化活性,还具有良好的光电性能。进行光化学(PEC)测试,在照明过程中,分离了基态的电子空穴,并检测到经过的电子可以产生电流。硫化铋(Bi 2 S 3 )作为半导体材料可以形成Bi 2 S 3 - BiVO 4 与钒酸铋的异质结;这样的Bi 2 S 3 -BiVO 4 异质结可以提高空穴和电子的分离效率,并且电流强度比BiVO大进行PEC测试时, 4 。硫化铋和钒酸铋的比例在一定范围内。 Bi 2 S 3 的含量与光电流大小成正比;通过测试光电流的大小,可以实现Bi 2 S 3 的定量计算,即获得量子点表面硫醇配体的含量。

著录项

  • 公开/公告号WO2020134305A1

    专利类型

  • 公开/公告日2020-07-02

    原文格式PDF

  • 申请/专利权人 TCL TECHNOLOGY GROUP CORPORATION;

    申请/专利号WO2019CN109684

  • 发明设计人 HUO RUI;DENG CHENGYU;LU ZIZHE;

    申请日2019-09-30

  • 分类号G01N27/416;G01N1/28;

  • 国家 WO

  • 入库时间 2022-08-21 11:10:24

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