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METHOD FOR QUANTITATIVELY MEASURING CONTENT OF THIOL LIGAND ON QUANTUM DOT SURFACE
METHOD FOR QUANTITATIVELY MEASURING CONTENT OF THIOL LIGAND ON QUANTUM DOT SURFACE
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机译:量子点表面硫醇含量的定量测定方法
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摘要
A method for quantitatively measuring a content of a thiol ligand on a quantum dot surface. Bismuth vanadate (BiVO4) is a visible light responding semiconductor material, has a good photocatalytic activity, and also has a good photoelectric property. Photoelectrochemical (PEC) test is performed, during illumination, an electron hole in a ground state is separated, and it is detected that transited electrons can generate a current. Bismuth sulfide (Bi2S3), as a semiconductor material, can form a Bi2S3-BiVO4 heterojunction with the bismuth vanadate; such Bi2S3-BiVO4 heterojunction can improve the separation efficiency of the hole and the electron, and has a larger current strength than BiVO4 when performing PEC test. A proportion of the bismuth sulfide and the bismuth vanadate is within a certain range; the content of Bi2S3 is proportional to a size of a photocurrent; and by testing the size of the photocurrent, quantitative calculation of Bi2S3 can be implemented, i.e., the content of the thiol ligand on the quantum dot surface is obtained.
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机译:一种定量测量量子点表面上硫醇配体含量的方法。钒酸铋(BiVO 4 Sub>)是一种可见光响应的半导体材料,具有良好的光催化活性,还具有良好的光电性能。进行光化学(PEC)测试,在照明过程中,分离了基态的电子空穴,并检测到经过的电子可以产生电流。硫化铋(Bi 2 Sub> S 3 Sub>)作为半导体材料可以形成Bi 2 Sub> S 3 Sub>- BiVO 4 Sub>与钒酸铋的异质结;这样的Bi 2 Sub> S 3 Sub> -BiVO 4 Sub>异质结可以提高空穴和电子的分离效率,并且电流强度比BiVO大进行PEC测试时, 4 Sub>。硫化铋和钒酸铋的比例在一定范围内。 Bi 2 Sub> S 3 Sub>的含量与光电流大小成正比;通过测试光电流的大小,可以实现Bi 2 Sub> S 3 Sub>的定量计算,即获得量子点表面硫醇配体的含量。
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