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MOUNTING DEVICE AND MOUNTING METHOD FOR GRATING RULER, GRATING MEASUREMENT SYSTEM AND LITHOGRAPHY MACHINE

机译:光栅尺的安装装置及安装方法,光栅尺测量系统及光刻机

摘要

A mounting device and a mounting method for a grating ruler, a grating measurement system and a lithography machine. The mounting device for a grating ruler comprises a mounting base plate (10) and an adaptive structure, one end face of the mounting base plate (10) being provided with a through hole (15), the through hole (15) being used for providing an optical path channel of a projection and exposure optical system of a lithography machine. The grating ruler (16) is connected to one end face of the mounting base plate (10), the adaptive structure comprises a flexible block (11), a stiffness damper (12) and a vibration absorption damper (13), and the flexible block (11), the stiffness damper (12) and the vibration absorption damper (13) are fixedly connected to the other end face of the mounting base plate (10). In this way, the influence of external heat transfer, vibration of a main substrate (14), thermal deformation of the main substrate (14), and air pressure fluctuation generated by a workpiece table (20) in a high-speed movement process on the measurement stability of the grating ruler (16) of the workpiece table (20) are reduced, thereby improving the measurement accuracy of the grating ruler (16) of the workpiece table (20).
机译:用于光栅尺的安装装置和安装方法,光栅测量系统以及光刻机。光栅尺的安装装置包括安装基板(10)和自适应结构,该安装基板(10)的一个端面设有通孔(15),该通孔(15)用于提供光刻机的投影和曝光光学系统的光路通道。光栅尺(16)连接到安装基板(10)的一个端面,该自适应结构包括柔性块(11),刚度阻尼器(12)和减振阻尼器(13),并且柔性在框体(11)上,刚性阻尼器(12)和减振阻尼器(13)固定地安装在安装基板(10)的另一端面上。这样,在高速移动过程中,外部传热,主基板(14)的振动,主基板(14)的热变形以及由工件台(20)产生的气压变动的影响受到影响。这样,降低了工件台(20)的光栅尺(16)的测量稳定性,从而提高了工件台(20)的光栅尺(16)的测量精度。

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