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HIGHLY ABRASIVE AND HIGHLY TRANSPARENT SILICA FOR USE IN TOOTHPASTE AND PREPARATION METHOD THEREOF

机译:牙膏中使用的高磨蚀性和高透明性二氧化硅及其制备方法

摘要

Disclosed are a highly abrasive and highly transparent silica for use in toothpaste and a preparation method thereof. The method comprises S1: adding a sodium sulfate solution into a reaction tank and raising the temperature to 60-65ºC; S2: adding a sodium silicate solution while stirring and raising the temperature to 60-65ºC, adding a sulfuric acid solution dropwise until a pH of 8.5 to 9.5 is reached, upon which acid addition is stopped and the resulting mixture is allowed to age; S3: adding a sodium silicate solution and a sulfuric acid solution at the same time to allow reaction at a pH controlled to be 8.0-9.0, and when the addition of the sodium silicate solution is complete, continuing to add the sulfuric acid solution dropwise until a pH of 4.5 to 5.0 is reached; and S4: subjecting silica thus formed to pressure filtering, washing, spray drying, and airflow breaking to obtain the silica. The silica obtained by the method has a light transmittance of ≥90% at a refractive index in the range of 1.448 to 1.460, and a copper loss value of ≥15mg, and thus has a high light transmittance at a high refractive index, and a high abrasion and cleaning performance at the same time.
机译:公开了一种用于牙膏的高度磨蚀性和高度透明的二氧化硅及其制备方法。该方法包括:S1:将硫酸钠溶液加入反应罐中,升温至60-65℃。 S2:边搅拌边加入硅酸钠溶液,升温至60-65℃,滴加硫酸溶液直至pH值达到8.5-9.5,停止加酸并使混合物老化。 S3:同时加入硅酸钠溶液和硫酸溶液,使反应在控制在8.0-9.0的pH下,当硅酸钠溶液加入完成后,继续滴加硫酸溶液直至pH值达到4.5至5.0; S4:对形成的二氧化硅进行加压过滤,洗涤,喷雾干燥,气流破碎,得到二氧化硅。通过该方法获得的二氧化硅在1.448-1.460的折射率下具有≥90%的透光率,并且铜损耗值≥15mg,因此在高折射率下具有高透光率,并且同时具有很高的耐磨性和清洁性能。

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