METHOD FOR MANUFACTURING TANTALUM CARBIDE (TaC) COATING LAYER USING CHEMICAL VAPOR DEPOSITION (CVD) AND PHYSICAL PROPERTIES OF TANTALUM CARBIDE MANUFACTURED USING SAME

摘要

The present invention relates to a method for manufacturing a material containing a TaC material having a particularly low impurity content and a TaC material formed thereby. The method for manufacturing a TaC material having a low impurity content according to an aspect of the present invention includes the steps of: preparing a base material; and forming a TaC coating layer on a surface of the base material at a temperature of 1,600-2,500C.;COPYRIGHT KIPO 2020