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MANUFACTURE METHOD OF MICELLAR POLYMER PROTECTIVE LAYER USING BLOCK COPOLYMER AND QUANTUM DOT USED THEREBY

机译:嵌段共聚物及其所用量子点的胶束状聚合物保护层的制备方法

摘要

The present invention relates to a method of manufacturing a micellar polymer protective film formed of a block copolymer, and to a quantum dot surrounded by a micelle polymer protective film prepared thereby, the step of preparing a quantum dot, and a first repeating unit of a block copolymer including the quantum dots and A step of preparing the block copolymer micelle polymer protective film surrounding the quantum dots by forming block copolymer micelle particles based on the interaction difference of the second repeating unit configuration, wherein the step of preparing the block copolymer micelle polymer protective film After dissolving the first repeating unit, the second repeating unit, and the quantum dot using a first solvent, the solvent composition of the first repeating unit and the second repeating unit is changed using a second solvent to surround the quantum dot. Is characterized in that to prepare a block copolymer micelle polymer protective film.
机译:本发明涉及一种由嵌段共聚物形成的胶束聚合物保护膜的制造方法,并涉及一种由由此制备的胶束聚合物保护膜包围的量子点,一种制备量子点的步骤以及一种由其形成的第一重复单元。包括量子点的嵌段共聚物和通过基于第二重复单元构型的相互作用差形成嵌段共聚物胶束颗粒来制备围绕量子点的嵌段共聚物胶束聚合物保护膜的步骤,其中制备嵌段共聚物胶束聚合物的步骤保护膜在使用第一溶剂溶解第一重复单元,第二重复单元和量子点之后,使用第二溶剂改变第一重复单元和第二重复单元的溶剂组成以包围量子点。其特征在于制备嵌段共聚物胶束聚合物保护膜。

著录项

  • 公开/公告号KR20200102631A

    专利类型

  • 公开/公告日2020-09-01

    原文格式PDF

  • 申请/专利权人 한국과학기술원;

    申请/专利号KR20190020826

  • 发明设计人 정연식;조남명;

    申请日2019-02-22

  • 分类号C09K11/02;C09D153;C09D7/20;C09K11/56;C09K11/70;

  • 国家 KR

  • 入库时间 2022-08-21 11:06:08

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