MASK REPAIR APPARATUS AND METHOD FOR REPAIRING MASK

摘要

[Problem] To provide a mask correction device capable of efficiently correcting defects in a target EUVL mask. [Solution means] The mask correction apparatus includes: Extreme Ultra Violet Lithography (EUVL) having a reflective layer, a first layer disposed over the reflective layer, a second layer disposed over the first layer, and a third layer disposed over the second layer An EUVL mask correcting apparatus for correcting defects in a target EUVL mask as a mask, wherein after etching a third layer by a first etching method and etching a third layer by a first etching method, a first etching method and The second layer is etched by another second etching method.