Measurement and control of overlay and edge placement errors

摘要

The overlay metrology system provides optical overlay measurements based on optically resolvable features and device-scale features for hybrid overlay targets, including optically-resolvable features and device-scale features. Create an optical tool error adjustment by measuring the difference between the based device-scale overlay measurements; Generate a target-to-device adjustment for the hybrid overlay target based on the position of the feature within the device area; Determine a device-related overlay measurement for one or more locations in the device area based on at least one of the optical overlay measurement, optical tool error adjustment, or target-to-device adjustment; A controller for providing overlay correctables for a device area to a lithography tool to modify an exposure condition for at least one subsequent exposure based on the device-related overlay measurement.