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PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS
PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS
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机译:光致抗蚀剂组合物和形成光照相图案的方法
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摘要
There is provided a photoresist composition useful for forming a photolithographic pattern by a negative tone development process. Also provided are a photolithographic pattern forming method by a negative tone developing process and a substrate coated with the photoresist composition. This composition, method and coated substrate are particularly applicable to the manufacture of semiconductor devices.
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