A HI-VACUUM PLASMA RESIDUAL GAS ANALIZER AND METHOD FOR ANALYSING RESIDUA GAS OF THE SAME

摘要

When the process proceeds in the process chamber, the exhaust gas that is exhausted has a high pressure that is sensed by the sensor, and is a sensor in the high vacuum area, which is more resistant to contamination than QMS-RGA applied in the semiconductor industry and has excellent analysis performance (discrimination). Disclosed is an economical high vacuum plasma residual gas analysis device and a residual gas analysis method using the same. The high vacuum plasma residual gas analysis apparatus of the present invention includes a process chamber in which a process is performed using plasma; An inlet port connected to the exhaust gas pipe of the process chamber and into which the exhaust gas is introduced; A low vacuum tube connected to the inlet; A low vacuum pump connected to the low vacuum pipe and the low vacuum pump pipe branched to make the exhaust gas into a low vacuum state before being introduced into the plasma cell; A plasma cell that draws in exhaust gas from the low vacuum tube and is connected to the high vacuum tube; A high vacuum pump disposed in a high vacuum tube connected to the outlet of the plasma cell to make the inside of the plasma cell in a high vacuum state; An electrode that generates plasma inside the plasma cell; An optical sensor that receives light from the plasma cell and measures a spectral distribution; And an outlet for discharging the exhaust gas of the high vacuum tube.