ECR APPARATUS FOR GENERATING IMPROVED ECR UNIFORM PLASMA

摘要

The present invention provides an improved ECR uniform plasma generating apparatus capable of remarkably increasing deposition uniformity. The improved ECR uniform plasma generating apparatus according to the present invention includes: a waveguide resonator; A microwave providing unit connected to the waveguide resonator to supply microwaves to the inner space of the waveguide resonator; And a linear reaction chamber disposed between the waveguide resonators. And a plurality of magnetic field generating means disposed on a side of the waveguide resonator to face the linear reaction chamber, wherein a plurality of slits are formed through the waveguide resonator, and the magnetic field generating means comprises a plurality of slits adjacent to each other. Each can be placed between.