Method and device for producing an optical arrangement for microlithography

摘要

The present invention relates to a test device for an optical arrangement, in particular a projection objective or a lighting system for a projection exposure system, for microlithography, and a method for producing an optical arrangement in which the optical arrangement is tested, the optical arrangement (2) being a Has operational orientation, which is given by the operational use, the optical arrangement further comprising at least one component with a movable component and wherein the test device comprises a receptacle (4) for the optical arrangement, in which the optical arrangement in the test device (1) can be arranged and which can be rotated between an operational orientation, in which an optical arrangement is arranged in the receptacle in the operational orientation, and a test orientation, and wherein the test device is designed such that an in the receptacle In the optical arrangement in the test orientation or after turning back from the test orientation into the operational orientation, the mobility of the at least one movable component can be checked.