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Projection exposure system with a tempered support structure and method for designing such
Projection exposure system with a tempered support structure and method for designing such
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机译:具有回火支撑结构的投影曝光系统及其设计方法
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摘要
The invention relates to a projection exposure system (1) for semiconductor lithography, comprising projection optics (9), in turn at least one optical element (34), for which an optical axis (35) is defined and held by a temperature-controlled support structure (32), wherein at least one temperature field (40) of the tempered support structure (32) is formed perpendicular to the optical axis (35). Furthermore, the invention relates to a method for the design of such a tempered support structure (32).
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