A reduced work function material and method of manufacture. The material comprises a film e.g. gold (Au) having a first surface contacting a substrate. The film may be a single crystal metal, an amorphous metal, or an electride and have a thickness of 500 nm or less. A second surface of the film comprises a flat smooth surface having a surface roughness less than 1 nm. At least one patterned area is formed on the second surface of the film or the film contacting surface of the substrate with a periodic or a non-periodic pattern having a width about 5 times a depth of the periodic or non-periodic pattern indents 30. Changing the surface geometry e.g. patterning of the film may produce a change in the work function of the film. The reduced and low work function materials alter electron emission performance, and can be used in a range of vacuum and nanoscale electronic devices e.g. thermionic devices.
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