A manufacturing method of a mask, and a mask. The manufacturing method of a mask comprises: forming a first patterned photoresist layer; forming photoresist patterns (20, 30); forming an electroformed layer (40); and forming a mask. The mask is manufactured by the above manufacturing method. The manufacturing method of a mask and the mask can reduce an angle of an opening of the electroformed layer (40), increase a light-emitting area, enhance thickness uniformity of the electroformed layer (40), and allow the thickness of the electroformed layer (40) to be adjusted.
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