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Methods and apparatus for high throughput SEM and AFM for characterization of nanostructured surfaces

摘要

A system and method is provided for of characterizing nanostructured surfaces. A nanostructure sample is placed in an SEM chamber and imaged. The system and method locates one of the nanostructures using images from the SEM imaging, excises a top portion of the nanostructure, places said top portion on a substrate such that the nanostructures are perpendicular to the substrate and a base of the top portion contacts the substrate, performs high energy ion beam assisted deposition of metal at the base to attach the top portion to the substrate, SEM imaging the top portions in the SEM chamber, determining coordinates of the top portions relative to the substrate from the SEM imaging of the top portions, placing the substrate in an AFM chamber, and performing AFM imaging of the top portions using the coordinates previously determined.

著录项

  • 公开/公告号US10714310B2

    专利类型

  • 公开/公告日2020.07.14

    原文格式PDF

  • 申请/专利权人

    申请/专利号US16559109

  • 发明设计人 Vijay Varadan;Pratyush Rai;Gyanesh Mathur;

    申请日2019.09.03

  • 分类号

  • 国家 US

  • 入库时间 2022-08-21 10:58:56

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