PROCÉDÉ DE REVÊTEMENT D'UNE COMPOSITION DE MASQUE DUR POUR LE TRANSFERT DE MOTIFS DANS UN SUBSTRAT DE SILICIUM

摘要

The present invention relates to a process of coating a hard mask composition on a silicon substrate comprising:a4) applying a composition comprised of metal oxide nanoparticles dispersed in an organic solvent onto a substrate to form a hard mask film,b4) baking the hard mask film,c4) coating a bottom antireflective coating on top of the hard mask film,d4) coating a photoresist on top of said antireflective coating,e4) patterning the resist forming a resist pattern,f4) etching through the bottom antireflective coating not protected by the resist pattern down to the hard mask coating with a fluorinated plasma,g4) etching through the hard mask layer not protected by the bottom antireflective coating and photoresist down to the silicon substrate with a chlorine plasma producing a patterned hard mask film, andh4) etching with a fluorinated plasma into the silicon substrate in those area not protected by the patterned hard mask film producing topographical features into the silicon features.