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Surface antireflection coating for atomization coating and surface antireflection coating

摘要

PROBLEM TO BE SOLVED: To provide a surface antireflection coating for atomization coating, which has high antireflection performance even in a thin film and has excellent jet blackness. A binder resin, carbon black, hydrophobized dry silica, roughening particles, a dye and a solvent are contained, and the roughening particles are polyamide resin particles having an average particle diameter of 10 μm or more and 20 μm, The addition amount of the polyamide resin particles is 10 parts by mass or more and 44 parts by mass with respect to 100 parts by mass of the binder resin, and the adding amount of the dry silica is 14 parts by mass or more with respect to 100 parts by mass of the binder resin. A surface antireflection coating for atomization coating, which is characterized in that [Selection diagram] None

著录项

  • 公开/公告号JP2020097730A

    专利类型发明专利

  • 公开/公告日2020.06.25

    原文格式PDF

  • 申请/专利权人 キヤノン化成株式会社;

    申请/专利号JP2019203517

  • 发明设计人 井野口 翔大;中谷 直治;

    申请日2019.11.08

  • 分类号

  • 国家 JP

  • 入库时间 2022-08-21 10:55:00

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