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BARRETTES DE MÉMOIRE COMPRENANT DES ÉTAGES ALTERNÉS VERTICALEMENT DE MATÉRIAU ISOLANT ET DE CELLULES DE MÉMOIRE ET PROCÉDÉS DE FORMATION DE BARRETTE DE MÉMOIRE COMPRENANT DES CELLULES DE MÉMOIRE COMPRENANT INDIVIDUELLEMENT UN TRANSISTOR ET UN CONDENSATEUR
BARRETTES DE MÉMOIRE COMPRENANT DES ÉTAGES ALTERNÉS VERTICALEMENT DE MATÉRIAU ISOLANT ET DE CELLULES DE MÉMOIRE ET PROCÉDÉS DE FORMATION DE BARRETTE DE MÉMOIRE COMPRENANT DES CELLULES DE MÉMOIRE COMPRENANT INDIVIDUELLEMENT UN TRANSISTOR ET UN CONDENSATEUR
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摘要
A memory array comprises vertically-alternating tiers of insulative material and memory cells, with the memory cells individually comprising a transistor comprising first and second source/drain regions having a channel region there-between and a gate operatively proximate the channel region. At least a portion of the channel region is horizontally-oriented for horizontal current flow in the portion between the first and second source/drain regions. A capacitor of the memory cell comprises first and second electrodes having a capacitor insulator there-between. The first electrode is electrically coupled to the first source/drain region. A horizontal longitudinally-elongated sense line is in individual of the memory-cell tiers. Individual of the second source/drain regions of individual of the transistors that are in the same memory-cell tier are electrically coupled to the horizontal longitudinally-elongated sense line in that individual tier of memory cells. A capacitor-electrode structure extends elevationally through the vertically-alternating tiers. Individual of the second electrodes of individual of the capacitors are electrically coupled to the elevationally-extending capacitor-electrode structure. An access-line pillar extends elevationally through the vertically-alternating tiers. The gate of individual of the transistors in different of the memory-cell tiers comprises a portion of the elevationally-extending access-line pillar. Other embodiments, including method, are disclosed.
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