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EMPREINTE DU CHAMP DE VISION SEM DANS DES MESURES EPE STOCHASTIQUES ET POSITIONNEMENT DANS DES DISPOSITIFS SEM GRAND CHAMP DE VISION

摘要

A method of reducing variability of an error associated with a structure on a wafer in a lithography process is disclosed. The method includes determining, based on an image (or images) obtained based on a scan of the wafer by a scanning electron microscope (SEM), a first error due to a SEM distortion in the image. The method also includes determining, based on the image, a second error associated with a real error of the structure, where the error associated with the structure comprises the first error and the second error. A command is generated by a data processor that enables a modification of the lithography process and an associated reduction of the variability of the error based on reducing any of the first error or the second error.

著录项

  • 公开/公告号EP3663855A1

    专利类型

  • 公开/公告日2020.06.10

    原文格式PDF

  • 申请/专利权人

    申请/专利号EP18210026.3

  • 发明设计人

    申请日2018.12.04

  • 分类号

  • 国家 EP

  • 入库时间 2022-08-21 10:54:28

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