ELIMINATION DE DEBRIS DANS UNE FOSSE D'UN MASQUE PHOTOLITHOGRAPHIQUE

摘要

A method for removing debris from a trench formed on a photolithographic mask, comprising:positioning a tip within the trench, the tip including a surface and a nanometer-scaled coating disposed thereon, the nanometer-scaled coating having a surface energy lower than a surface energy of the photolithographic mask;moving the tip within the trench to physically adhere debris to the tip;moving the tip with the debris away from the trench; and removing the debris from the tip.