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Development of gallium-oxide (Ga2O3) coatings by non-aqueous sol-gel routes for electronic applications

机译:通过非水溶胶-凝胶路线开发用于电子应用的氧化镓(Ga2O3)涂层

摘要

The overall aim of this thesis was to develop a sol-gel gallium oxide (Ga2O3) coating and to study the phase evolution in coating, and to evaluate theoretically the crystal structure and electrical properties of coating by modelling the intrinsic- and doped-Ga2O3 structure using Materials Studio software, and to solid theoretical result, experimental work was performed and compared with the simulation results. The most stable phase of gallium oxide (β-Ga2O3) is a wide band gap (4.9eV) metal oxide having a wide range of important applications. β-Ga2O3 is thermally and chemically stable at high temperatures and so exhibits very stable operating characteristics over large temperature ranges. The major limitations of this coating arise from it having high resistivity. Monoclinic gallium oxide (β-Ga2O3) is one of the most promising materials for the device applications because of its wide band gap which gives high transparency from the visible into the UV wavelength regions (~260 nm). However, the high electrical resistivity of Ga2O3 coatings is going to be a significant issue making limitation for this coating to be used in optoelectronic devices. Therefore, incorporation of dopants to reduce Ga2O3 resistivity is desirable. To develop Ga2O3 coating, two types of sols were prepared in this work using gallium isopropoxide as the starting precursor. The first sol (Type-I sol) was prepared via an aqueous route based on the method developed by Yoldas for alumina sol-gel coatings. The other sol (Type-II sol) was prepared via a non-aqueous route involving 2-methoxyethanol (MOE) as the solvent. The principle of coating process was the deposition of these sols onto substrate (glass and quartz) by spin coating followed by drying and then heat treating at elevated temperature. The Type-I sol did not gelate during the deposition process as evidenced by the lack of any visible coating on the substrates. In contrast, the Type-II sol produced obvious coatings, albeit with varying extent of cracking depending on the deposition and heat-treatment conditions. In another stage of project, the effects of the coating thickness, heat treatment conditions, and substrate type on coating structural evolution were investigated. Phase composition in the Ga2O3 sol-gel coating was studied as function of heat-treatment conditions. The initial deposited phase of gallium oxide transformed to α-Ga2O3 and then to β-Ga2O3 with increasing temperature. At 500°C, α-Ga2O3 phase started to form and upon heating at 900°C, β-Ga2O3 was only stable phase of gallium oxide. Subsequent heat treatment at different heating temperature for 2 h affected the coating behaviour in terms of the amount of cracking. The amount of cracking tended to increase with increasing heating rate and with increasing coating thickness. The choice of substrates for Ga2O3 was studied since it is critical and substantial for making high-quality coatings. In this work, the effect of adding different dopants on the electrical properties of gallium oxide coatings were investigated theoretically using software called Materials Studio. The Modeling of Ga2O3 showed that the introduction of the Sn and Zn caused the impurity energy level at the bottom of the conduction band. Therefore, the conductivity of the Zn-doped and Sn-doped β-Ga2O3 was improved compared to the intrinsic β-Ga2O3.In order to assess the simulation result and obtain how much the results are close to the practical results, experimental work was carried out by measuring the bandgap of pure β-Ga2O3, Zn3%-doped Ga2O3, and Zn6%-doped Ga2O3. The study indicated that in spite of a deviation in values between the experiment and simulation, the values were considered fit well, and there was a consistency between simulation and experiment results. It was found that the experimental value of the bandgap energy for pure β-Ga2O3 agreed reasonably well with values reported in the literature and the experimental values for the pure and doped coatings were consistently ~2 times higher than the simulated values which suggested that the structural model used to calculate the bandgap energies systematically underestimated the values. This was attributed to limitations in the structural model. Regardless, the structural model was considered reliable for predicting the effects of dopants on selected structural and electronic properties of Ga2O3.
机译:本文的总体目标是开发一种溶胶-凝胶氧化镓(Ga2O3)涂层并研究涂层中的相演化,并通过对Ga2O3的本征和掺杂结构进行建模,从理论上评估涂层的晶体结构和电性能。使用Materials Studio软件,并获得可靠的理论结果,进行了实验工作并将其与仿真结果进行了比较。氧化镓(β-Ga2O3)最稳定的相是宽带隙(4.9eV)金属氧化物,具有重要的应用范围。 β-Ga2O3在高温下具有热稳定性和化学稳定性,因此在较大温度范围内均表现出非常稳定的工作特性。该涂层的主要局限性在于它具有高电阻率。单斜晶系氧化镓(β-Ga2O3)是宽带应用的最有希望的材料之一,因为它的宽带隙使从可见光到UV波长区域(〜260 nm)具有很高的透明度。但是,Ga 2 O 3涂层的高电阻率将成为一个重大问题,从而限制了该涂层在光电器件中的使用。因此,需要掺入掺杂剂以降低Ga 2 O 3电阻率。为了开发Ga2O3涂层,在这项工作中使用异丙醇镓作为起始前体制备了两种类型的溶胶。基于由Yoldas开发的用于氧化铝溶胶-凝胶涂料的方法,经由水性途径制备第一溶胶(I型溶胶)。另一种溶胶(II型溶胶)是通过以2-甲氧基乙醇(MOE)为溶剂的非水途径制备的。涂覆过程的原理是通过旋涂将这些溶胶沉积在基板(玻璃和石英)上,然后干燥,然后在高温下进行热处理。 I型溶胶在沉积过程中没有凝胶化,这在基材上没有任何可见涂层的情况下得到了证明。相反,II型溶胶产生了明显的涂层,尽管取决于沉积和热处理条件,其开裂程度不同。在项目的另一个阶段,研究了涂层厚度,热处理条件和基材类型对涂层结构演变的影响。研究了Ga2O3溶胶-凝胶涂层中的相组成与热处理条件的关系。氧化镓的初始沉积相随温度升高而转变为α-Ga2O3,然后转变为β-Ga2O3。在500°C时开始形成α-Ga2O3相,在900°C加热时,β-Ga2O3只是氧化镓的稳定相。随后在不同的加热温度下进行2小时的热处理会影响涂层的开裂程度。裂纹的数量倾向于随着加热速率的增加和涂层厚度的增加而增加。研究了Ga2O3基材的选择,因为它对于制造高质量涂层至关重要且至关重要。在这项工作中,使用称为Materials Studio的软件从理论上研究了添加不同掺杂剂对氧化镓涂层电性能的影响。 Ga2O3的建模表明,Sn和Zn的引入会在导带的底部引起杂质能级。因此,与本征β-Ga2O3相比,Zn掺杂和Sn掺杂的β-Ga2O3的电导率有所提高。为了评估模拟结果并获得多少结果与实际结果相近,进行了实验工作通过测量纯β-Ga2O3,Zn3%掺杂的Ga2O3和Zn6%掺杂的Ga2O3的带隙来确定。研究表明,尽管实验和模拟之间的值存在偏差,但仍认为这些值很合适,并且模拟和实验结果之间具有一致性。发现纯β-Ga2O3的带隙能实验值与文献报道的值相当吻合,纯和掺杂涂层的实验值始终比模拟值高约2倍,这表明结构用于计算带隙能量的模型会低估这些值。这归因于结构模型的局限性。无论如何,该结构模型被认为可可靠地预测掺杂剂对Ga2O3所选结构和电子性能的影响。

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