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Field-Driven Mott Gap Collapse and Resistive Switch in Correlated Insulators

机译:相关绝缘子中的场驱动Mott间隙塌陷和电阻开关

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摘要

Mott insulators are "unsuccessful metals" in which Coulomb repulsion prevents charge conduction despite a metal-like concentration of conduction electrons. The possibility to unlock the frozen carriers with an electric field offers tantalizing prospects of realizing new Mott-based microelectronic devices. Here we unveil how such unlocking happens in a simple model that shows the coexistence of a stable Mott insulator and a metastable metal. Considering a slab subject to a linear potential drop, we find, by means of the dynamical mean-field theory, that the electric breakdown of the Mott insulator occurs via a first-order insulator-to-metal transition characterized by an abrupt gap collapse in sharp contrast to the standard Zener breakdown. The switch on of conduction is due to the field-driven stabilization of the metastable metallic phase. Outside the region of insulator-metal coexistence, the electric breakdown occurs through a more conventional quantum tunneling across the Hubbard bands tilted by the field. Our findings rationalize recent experimental observations and may offer a guideline for future technological research.
机译:莫特绝缘子是“不成功的金属”,尽管有类似电子的导电电子浓度,但其中的库仑斥力阻止电荷传导。利用电场解锁冻结的载体的可能性为实现基于Mott的新型微电子设备提供了诱人的前景。在这里,我们揭示了在一个简单的模型中如何发生这种解锁,该模型显示了稳定的Mott绝缘子和亚稳态金属的共存。考虑一个承受线性电势降的平板,我们通过动态平均场理论发现,莫特绝缘子的电击穿是通过一阶绝缘体到金属的过渡而发生的,其特征是突然的间隙塌陷。与标准的齐纳击穿形成鲜明对比。传导的接通归因于亚稳态金属相的场驱动稳定性。在绝缘体与金属共存的区域之外,通过击穿电场倾斜的哈伯德带的更常规的量子隧穿发生电击穿。我们的发现使最近的实验观察合理化,并可能为将来的技术研究提供指导。

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