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The Effect of Film Thickness and Content on Film Formation from PS/ Nanocomposites Prepared by Dip-Coating Method

机译:通过浸涂法制备的PS /纳米复合材料的膜厚度和含量对膜形成的影响

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摘要

Steady-state fluorescence (SSF) technique in conjunction with UV-visible (UVV) technique and atomic force microscope (AFM) was used for studying film formation from TiO2 covered nanosized polystyrene (PS) latex particles (320 nm). The effects of film thickness and TiO2 content on the film formation and structure properties of PS/TiO2 composites were studied. For this purpose, two different sets of PS films with thicknesses of 5 and 20 μm were prepared from pyrene-(P-) labeled PS particles and covered with various layers of TiO2 using dip-coating method. These films were then annealed at elevated temperatures above glass transition temperature (??) of PS in the range of 100–280°C. Fluorescence emission intensity, ?? from P and transmitted light intensity, ?tr were measured after each annealing step to monitor the stages of film formation. The results showed that film formation from PS latexes occurs on the top surface of PS/TiO2 composites and thus developed independent of TiO2 content for both film sets. But the surface morphology of the films was found to vary with both TiO2 content and film thickness. After removal of PS, thin films provide a quite ordered porous structure while thick films showed nonporous structure.
机译:稳态荧光(SSF)技术与UV可见(UVV)技术和原子力显微镜(AFM)一起使用从TiO 2覆盖纳米化聚苯乙烯(PS)胶乳颗粒(320nm)的膜形成。研究了膜厚度和TiO2含量对PS / TiO2复合材料的膜形成和结构性能的影响。为此目的,由厚厚的PS颗粒制备两组不同的PS膜,厚度为5和20μm,并使用浸涂方法用各种TiO 2覆盖。然后在玻璃化转变温度(Δθ)的升高的温度下在100-280℃的范围内退火这些薄膜。荧光发射强度,??从P和透射光强度,在每个退火步骤后测量ΔTR以监测膜形成的阶段。结果表明,来自PS胶乳的膜形成在PS / TiO2复合材料的顶表面上,因此与两种薄膜组无关的TiO 2含量。但发现薄膜的表面形态与TiO 2含量和膜厚度不同。除去PS后,薄膜提供相当有序的多孔结构,而厚膜显示无孔结构。

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