Semiconductor Measurement Technology: Metrology for Submicrometer Devices and Circuits

摘要

The metrological requirements of semiconductor microelectronics, always challenging, are made even more stringent by the trend toward submicrometer devices and structures. This comes about not only because of the obvious demands associated with the smaller feature sizes of circuit elements but also because of the attendant requirements for more efficient design verification aids, computer simulations, and process validation and control techniques and because of the concurrent trend toward larger die and package sizes. This paper examines the types of metrological requirements associated with submicrometer devices and structures, summarizes the present state of the art in selected critical areas of metrology, and reviews current research and development efforts on advanced measurement technology, especially those at the National Bureau of Standards.