Measurement Assurance for Dimensional Measurements on Integrated-Circuit Photomasks

摘要

Optical Microscope Linewidth-Measurement Standards, SRM-474 and SRM-475, have been developed by NBS for optical imaging systems capable of making line-spacing and linewidth measurements in the 0.5 micrometer - 12 micrometers regime on IC photomasks. Each artifact affords a means of reducing systematic errors via a calibration curve and keeping the optical system in statistical control. Procedures are given for accomplishing these goals along with a discussion of the uncertainty of the calibrated values.