Atomic Oxygen Cleaning Shown to Remove Organic Contaminants at Atmospheric Pressure

摘要

The NASA Lewis Research Center has developed and filed for a patent on a method to produce atomic oxygen at atmospheric pressure by using a direct current arc in a gas flow mixture of oxygen and helium. A prototype device has been tested for its ability to remove various soot residues from surfaces exposed to fire, and various varnishes such as acrylic and egg white.