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Deposition of sputtered molybdenum disulfide films and friction characteristics of such films in vacuum

机译：溅射的二硫化钼薄膜的沉积和这种薄膜在真空中的摩擦特性

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摘要

Sputtered molybdenum disulfide film deposition and friction characteristics in vacuum

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作者
Przybyszewski, J. S.; Spalvins, T.;
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年度 1967
页码 1-14
总页数 14
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
FRICTION REDUCTION; LUBRICATION; MOLYBDENUM DISULFIDES; SPUTTERING; THIN FILMS; VACUUM DEPOSITION; COATINGS; COEFFICIENT OF FRICTION; SLIDING FRICTION; ULTRAHIGH VACUUM; VACUUM CHAMBERS;

机译：减少摩擦;润滑; mOLYBDENUm DIsULFIDEs;溅射;薄膜;真空沉积;涂料;摩擦系数;滑动摩擦; ULTRaHIGH VaCUUm; VaCUUm CHamBERs;

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专利

1. Effect of Retention Time in Vacuum on Analytical Values by EPMA for Oxygen Contents and S/Mo Ratio of Molybdenum Disulfide Sputtered Films [J] . Kiyonori Koguma, Michiaki Ikeda, Nobuhiko Ota, Japanese Journal of Tribology . 2006,第6期

机译：真空中的保留时间对EPMA溅射二氧化钼薄膜中氧含量和S / Mo比的分析值的影响
2. Mechanism of Sliding Friction in Air for Molybdenum Disulfide Films Sputtered onto SUS440C Steel Rollers [J] . Kiyonori Koguma, Michiaki Ikeda, Kenji Sunahara, Japanese Journal of Tribology . 2006,第6期

机译：SUS440C钢辊上溅射的二硫化钼薄膜在空气中的滑动摩擦机理
3. Friction of molybdenum disulfide-titanium films under cryogenic vacuum conditions [J] . C. G. Dunckle, M. Aggleton, J. Glassman, Tribology International . 2011,第12期

机译：低温真空条件下二硫化钼钛薄膜的摩擦
4. Friction and Wear Characteristics in Air of Molybdenum Disulfide Sputtered Films Introduced Dry Air to Vacuum Chamber after Sputtering [C] . Kenji Matsuda, Kiyonori Koguma, Motohiro Kaneta, World Tribology Congress . 2009

机译：二硫化钼溅射膜的空气中的摩擦和磨损特性将干燥空气引入真空室后溅射
5. Rational Fabrication of Molybdenum Disulfide and Metal-Doped Molybdenum Disulfide Thin Films via Electrodeposition Method for Energy Storage, Catalysis, and Biosensor Applications [D] . Giang, Hannah. 2020

机译：通过电沉积法为能量储存，催化和生物传感器应用的电沉积方法合理制备二硫化钼和金属掺杂钼二硫化薄膜
6. Ultrahigh vacuum dc magnetron sputter-deposition of epitaxial Pd(111)/Al2O3(0001) thin films [O] . Angel Aleman, Chao Li, Hicham Zaid, -1

机译：外延Pd（111）/ Al2O3（0001）薄膜的超高真空直流磁控溅射沉积
7. Effect of Deposition Pressure on the Microstructure and Optical Band Gap of Molybdenum Disulfide Films Prepared by Magnetron Sputtering [O] . 2019

机译：沉积压力对磁体溅射制备的钼二硫膜微观结构和光带隙的影响
8. Deposition of Sputtered Molybdenum Disulfide Films and Friction Characteristics of Such Films in Vacuum [R] . Przybyszewski, J. S., Spalvins, T. 1967

机译：溅射二硫化钼薄膜的沉积及其在真空中的摩擦特性

Deposition of sputtered molybdenum disulfide films and friction characteristics of such films in vacuum

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