Sensitivity studies of the chemical scheme of the IVL photochemical trajectory model

摘要

Sensitivity tests of the updated chemical scheme of the IVL photochemical trajectory model have been performed for two chemical environments. The chemical description of the model has been investigated regarding the gas phase chemistry and the deposition. Among the chemical levels tested in the gas phase chemistry of the model, the reactions between organic peroxy radicals and HO2 have the most significant effect on the calculated concentrations of ozone. For a low NOx environment, the reactions among peroxy radicals also have a similar influence on the simulated ozone concentration. The deposition of ozone has a significant influence on the calculated concentrations of ozone whereas the deposition of other species has a limited influence. A preliminary investigation of some heterogeneous reactions has been performed. Empirical data have been used to simulate the heterogeneous formation of HONO and HNO3. These calculated values compare well with concentrations measured in ambient air. 23 refs, 14 figs, 16 tabs