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Comparisons of physical and chemical sputtering in high density divertor plasmas with the Monte Carlo Impurity (MCI) transport model

机译:高密度偏滤等离子体中物理和化学溅射与蒙特卡罗杂质(mCI)传输模型的比较

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The MCI transport model was used to compare chemical and physical sputtering for a DIII-D divertor plasma near detachment. With physical sputtering alone the integrated carbon influx was 8.4 x 10(sup 19) neutral/s while physical plus chemical sputtering produced an integrated carbon influx of 1.7 x 10(sup 21) neutrals/s. The average carbon concentration in the computational volume increased from 0.012% with only physical sputtering to 0.182% with both chemical and physical sputtering. This increase in the carbon inventory produced more radiated power which is in better agreement with experimental measurements.

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