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In-Depth Magnesium Film Composition Profiles by AES

机译:aEs的深度镁膜组成型材

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For an approach to study the properties of thin film which is used as a target in nuclear physics, elemental concentration depth profiles of the evaporated film composed of Mg/C/TP/G structures are evaluated by Auger Electron Spectroscopy (AES) coupled with Ar exp + -ion sputter etching. It is recognized that O-components present in the C layer contributed to Mg oxidization in the initial stage of evaporation. By subsequent peeling oxidization was further enhanced in the bulk roughly at the same level as that at the Mg/C interface. From the investigated behaviors of the amorphous parting agent, Teepol (TP), the possibility of Mg films, being unbacked from Mg/C/G structures is suggested. Depth profiles of 33 eV (uncorrected) signal are thought to give support to the assumption, made by Janssen et al., concerning the Mg exp 2+ L/sub 2,3/O exp 2- L sub 1 MgV (interfacial) transition given to the corresponding peak at 27 eV. (Atomindex citation 09:409355)

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