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Method for Studying Activity Profiles in Surface Layers

机译:研究表面层中活动轮廓的方法

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A method is described for obtaining an activity profile for oxidized steel specimens in which the surface layers are eroded by sputtering with a beam of argon ions. The sputtered material is collected on metal plates for subsequent activity measurement. The method has been shown to produce sputtering rates of around 1 mu g mC exp -1 , corresponding to thinning rates of about 1 mu m h exp -1 . The sputtered material could be collected with 25 to 50% geometrical efficiency. The depth resolution was about 20 nm. (Atomindex citation 10:463747)

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