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Current Research Using the ANL High Voltage Electron Microscope-Tandem Accelerator Facility

机译:使用aNL高压电子显微镜 - 串联加速器设备的当前研究

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Recent work at the Argonne National Laboratory, (ANL), HVEM-Tandem Accelerator user facility is summarized: direct observation of cluster defects formed by in-situ ion irradiation at low temperature using the ion-beam interface has led to important fundamental results on defect production processes. Results on solute segregation at elevated temperatures induced by electron and ion irradiation are reported. Other published work is briefly summarized and/or referenced. (ERA citation 10:016873)

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