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Small Sample Analysis Using Sputter Atomization/Resonance Ionization Mass Spectrometry

机译:使用溅射雾化/共振电离质谱的小样品分析

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We have used secondary ion mass spectrometry (SIMS) to investigate the emission of ions via argon sputtering from U metal, UO sub 2 , and U sub 3 O sub 8 samples. We have also used laser resonance ionization techniques to study argon-sputtered neutral atoms and molecules emitted from these same samples. For the case of U metal, a significant enhancement in detection sensitivity for U is obtained via SA/RIMS. For U in the fully oxidized form (U sub 3 O sub 8 ), SA/RIMS offers no improvement in U detection sensitivity over conventional SIMS when sputtering with argon. 9 refs., 1 fig., 2 tabs. (ERA citation 12:004438)

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