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Studies of Electronic and Optical Materials: A. Interactions of Oxygen with Si-GeAlloys and B. Deposition of Films for Optical Storage Applications

机译:电子和光学材料的研究:a。氧与si-Ge合金的相互作用和B.用于光存储应用的膜的沉积

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Experimental studies and modeling of atomic bonding have been carried out foramorphous covalent alloys and CVD diamond films. The following results have been obtained: (1) Two distinct growth regimes have been found for CVD diamond films: an initial period of rapidly increasing roughness, followed by a slower increase as the diamond film grows further. (2) The difficulty in incorporating more than 10 at 96 N in PECVD a-CxNyHz films is related to plasma etching of the films. (3) Predictions for bonding in low epsilon alloys: Si-O and Si-F bonds are preferred in a-SiO2:F while Si-O, Si-F, and O-H bonds are preferred in a-SiO2:F:H. (4) A procedure has been developed for determining the optical constants and the volume fraction of the non-diamond carbon component of CVD diamond films. (5) Entropy have been found to play a critical role in determining the atomic bonding in diamond like carbon alloys. (6) Phase separation is predicted to occur in a-SixCyGez alloys due to the preference for Si-C and Ge-Ge bonds.

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