Modeling and Control for Rapid Thermally Driven Deposition Processes

摘要

The objectives of this program were the study of the chemistry of YBCO thin film deposition by MOCVD, and the model-based control of MOCVD reactors. Model reduction techniques were applied to chemical vapor deposition (CVD) of YBCO thin films. This work has paralleled some of the work of Goodwin et al at Caltech sponsored under the DARPA VIP Phase I program, but with significantly different approach and emphasis. Under this program, the above chemistry was investigated from first principles using quantum chemistry computations (led by MIT). The kinetic and thermodynamic information obtained from these studies were used to generate a kinetic mechanism, which was then coupled to transport models for fluid flow, heat and mass transfer in CVD reactors. These coupled reaction-transport models were used to derive reduced order models for process control.