Projecting Deep-Subwavelength Patterns from Diffraction-Limited Masks Using Metal-Dielectric Multilayers

摘要

We utilize a metal-dielectric multilayer structure to generate deep- subwavelength one-dimensional and two-dimensional periodic patterns with diffraction-limited masks. The working wavelength and the pattern are set by the flexible design of the multilayer structure. This scheme is suitable to be applied to deep-subwavelength photolithography. As an example, we numerically demonstrate pattern periods down to 50 nm under 405 nm light illumination.