Imaging Under Extreme Conditions.

摘要

The study of materials and their surfaces under extreme conditions is fundamental to their functions and to control of properties. In order to visualize the changes in the structure, we have advanced ultrafast electron microscopy (and diffraction) to a new level. The electron pulses typically have an energy of 30 keV for diffraction and 100-200 keV for microscopy, corresponding to speeds of 33-70% of the speed of light. The atomic-scale resolution is achieved with a time resolution of femtoseconds, as reported in the publications; attosecond resolution has also been described therein. Such attosecond electron pulses are significantly shorter than those achievable with extreme UV light sources near 25 nm (approximately 50 eV) and have the potential for applications in the visualization of ultrafast electron dynamics.