Scattered-Light Photoelastic Analyses of Tunnel Intersections and a VLF Hollow-Post Insulator.

摘要

A scattered-light photoelastic stress analysis was performed on models of a VLF hollow-post insulator and a tunnel intersection configuration. A scattered-light polariscope was designed and fabricated in order to perform the analysis. Stress concentrations were found to be more than two times the applied loading in the insulator model and four times the applied loading in the tunnel intersection model. Except for special instances,the conventional three-dimensional photoelastic technique is still more practical for photoelastic applications in small laboratory studies.