Fabrication of Integral Solar Cell Covers by the Plasma Activated Source

摘要

An RF plasma in oxygen was used as a source for activated oxygen molecules which were reacted with, for example, silane at a solar cell surface to deposit amorphous silicon dioxide on the solar cell, to act as a protective cover. One hundred micrometers of SiO2 could be deposited. The coatings exhibited considerable intrinsic stress on 12-mil cells. Attempts to reduce the stress by mixing Al2O3 with SiO2 were not successful because of insufficient control of the mixing ratio. (Author)