Photoelectrochemical Depositions of Microscopic Metal Film Patterns on Si and GaAs

摘要

Microscopic metal film patterns have been imaged on p-Si and n- and p-GaAs by photoelectrochemical deposition from standard aqueous plating solutions. The photodeposition of Cu, Ni, Pd and Au films was investigated. Resolution exceeding 10 micrometers has been achieved for deposits on Au on p-GaAs and Cu on p-Si. (Author)