Studies of Electronic and Structural Interactions at Surfaces: Metal Overlayers on Semiconductors

摘要

We have examined the electronic interactions and structural modifications which occur when metal overlayers are deposited onto clean semiconductor surfaces. We have examined these interactions as the physical and chemical parameters of the surface/interface are changed, have assessed atomic interdiffusion and overlayer reaction and have determined whether clusters form and how they affect the properties of the interface. We have sought fundamental information describing interface evolution from the initial adatom on a surface through the growth of the extended, fully-reacted, microscopic interface.