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In-situ Surface during Laser-Controlled Chemical Processing of Surfaces

机译:表面激光控制化学处理过程中的原位表面

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Experiments designed to assess the utility of several methods of surface analysis under reaction conditions are described. The goal of the research was to develop new methods with which to understand the mechanisms associated with the preparation of materials of electronic interest by chemical vapor deposition, with an emphasis on laser control of the reactions. The focus of the work was improve the sensitivity of unenhanced surface Raman spectroscopy through the combined use of ultraviolet lasers, Cassegrain optical systems and charge-coupled device detectors. Model systems to test these technical improvements were designed and an understanding of the factors that govern sensitivity has been achieved. Construction of a system for laser direct writing as well as the installation of a multipurpose surface analysis system are also described. Keywords: Unenhanced surface Raman spectroscopy; Surface chemistry; Electronic materials. (jhd)

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