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Unique Interchangeable Shadow Mask Technology for Advanced High DefinitionDisplay

机译：独特的可互换阴影蒙版技术，用于高级高清显示

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摘要

A unique interchangeable shadow mask and interchangeable phosphor screeningsystem has been developed for the 22 inch flat tension mask cathode ray tube.

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作者
Sindelar, C. J.; Prazak, C.;
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年度 1993
页码
总页数 53
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Masks; Faceplates; Cathode ray tubes; Phosphors;

机译：面具;面板;阴极射线管;荧光粉;

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专利

1. Silicon Shadow Mask Technology for Aligning and In Situ Sorting of Semiconducting SWNTs for Sensitivity Enhancement: A Case Study of NO2 Gas Sensor [J] . Agarwal Pankaj B., Sharma Rishi, Mishra Dharmesh, ACS applied materials & interfaces . 2020,第36期

机译：用于对齐的硅荫罩技术，用于对齐的半导体SWNT进行对准，敏感性增强：NO2气体传感器的案例研究
2. Micro-optics and lithography simulation are key enabling technologies for shadow printing lithography in mask aligners [J] . Reinhard Voelkel, Uwe Vogler, Arianna Bramati, Advanced Optical Technologies . 2015,第1期

机译：微光学和光刻模拟是掩模对准器中阴影印刷光刻的关键技术
3. Effects of surface treatment of ITO anode layer patterned with shadow mask technology on characteristics of organic light-emitting diodes [J] . Cheol Young Park, Jong Ho Lee, Bum Ho Choi Organic Electronics . 2013,第12期

机译：荫罩技术构图的ITO阳极层表面处理对有机发光二极管特性的影响
4. Advanced mask-to-mask overlay analysis for next generation technology node reticles [C] . Klaus-Dieter Roeth, Frank Laske, Karl-Heinrich Schmidt, Photomask and next-generation lithography mask technology XVII . 2010

机译：用于下一代技术节点掩模版的高级掩模到掩模覆盖分析
5. Key Challenges in EUV Mask Technology: Actinic Mask Inspection and Mask 3D Effects. [D] . Wang, Yow-Gwo. 2017

机译：EUV掩模技术的主要挑战：光化掩模检测和掩模3D效果。
6. Randomised Comparison of the AMBU AuraOnce Laryngeal Mask and the LMA Unique Laryngeal Mask Airway in Spontaneously Breathing Adults [O] . Daryl Lindsay Williams, James M. Zeng, Karl D. Alexander, 2012

机译：自发性呼吸的成年人AMBU AuraOnce喉罩和LMA独特喉罩气道的随机比较
7. Silicon Shadow Mask Technology for Aligning and In Situ Sorting of Semiconducting SWNTs for Sensitivity Enhancement: A Case Study of NO2 Gas Sensor [O] . -1

机译：用于对准的硅荫罩技术，用于对敏感性增强的半导体SWNT的对准和原位分类：一种NO2气体传感器的案例研究

Unique Interchangeable Shadow Mask Technology for Advanced High DefinitionDisplay

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