Apparatus and Method for Achieving Growth-Etch Deposition of Diamond using aChopped Oxygen-Acetylene Flame

摘要

A novel apparatus and method for the cyclic growth-etch deposition of diamond ona substrate by flame chemical vapor deposition (CVD) is developed. The cyclic growth-etch diamond deposition is accomplished by placing a suitable substrate to be coated under a CVD flame and providing a disk or face plate or other shapes having one or more teeth (or holes) wherein upon rotation of the disk, or face plate, or other shape, the teeth attached to the disk, or face plate, or other shape obstruct the path of the CVD flame from contacting the substrate at a desired time scale of T(growth) and t(cycle) to produce high quality FWHM of 1-3.5/cm diamond. (jg).