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Resonant magnetic X-ray scattering at the lanthanide M-5 edges

机译:镧系M-5边缘的共振X射线电磁散射

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摘要

Magnetic soft X-ray scattering at the Ho M-5 resonance was characterized using thin films, thus reducing the effect of the strong photon absorption. Magnetic scattering factors are found to be as large as 200r(0) at resonance, while the effective probing depth of the X-rays at the resonance maximum is of the order of 30 Angstrom at 2theta = 25degrees. The huge enhancement of magnetic scattering allows one to study ultrathin Ho films, which is exploited to investigate the thickness dependence of the Neel temperature in these long-period antiferromagnets. The tunable X-ray penetration depth across the resonance can be used for magnetic depth profiling, e.g. to study the depth-dependent growth of antiferromagnetic domains across the ferromagnetic/antiferromagnetic phase transition in Dy metal films. (C) 2004 Elsevier B.V. All rights reserved.
机译:使用薄膜对在Ho M-5共振处的软X射线电磁散射进行了表征,从而降低了强光子吸收的影响。发现在共振处的磁散射因子高达200r(0),而在共振最大处X射线的有效探测深度在2θ= 25度时约为30埃。磁散射的巨大增强使人们可以研究超薄Ho膜,该膜被用于研究这些长周期反铁磁体中Neel温度的厚度依赖性。跨共振的可调X射线穿透深度可用于磁深度分析,例如以研究Dy金属膜中跨铁磁/反铁磁相变的反铁磁畴的深度依赖性生长。 (C)2004 Elsevier B.V.保留所有权利。

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