首页> 外文期刊>Philosophical magazine: structure and properties of condensed matter >Texture development and Monte-Carlo simulation of microstructure evolution in pure Zr grain-refined by equal channel angular pressing
【24h】

Texture development and Monte-Carlo simulation of microstructure evolution in pure Zr grain-refined by equal channel angular pressing

机译:等通道角挤压精制纯Zr晶粒的织构发展和微观组织演化的蒙特卡罗模拟

获取原文
获取原文并翻译 | 示例
           

摘要

The evolution of the grain boundary character distribution (GBCD) of severely deformed commercial purity Zr was studied by experiment as well as computer simulation. The severe plastic deformation was performed by equal channel angular pressing (ECAP) at 350°C using a die with 90°/20°. Through a repetitive operation, it was possible to reduce the grain size of specimens from 20 μm to about 300 nm with high angle grain boundaries. During the severe deformation, a strong texture developed in specimens, which could be traced through a viscoplastic self-consistent (VPSC) model. Combination of prism slips and mechanical twinning were presumed to operate during the severe deformation that was predominantly shear in character. Grain growth kinetics of severely deformed specimens were studied by optical microscopy as well as by Monte-Carlo computer simulation, which showed a grain growth exponent, n, ranging from 0.25 to 0.44. For the computer simulation, a direct mapping method was developed such that the orientation image map (OIM) obtained by electron back scattered diffraction (EBSD) was digitized and planted into the simulation microstructure grid. The grain growth, which can be characterized as normal growth, was accompanied by unaltered distribution characteristics of the boundary misorientation angles and tenacious trait of the texture.
机译:通过实验和计算机模拟研究了严重变形的商业纯度Zr的晶界特征分布(GBCD)的演变。通过使用90°/ 20°的模具在350°C下通过等通道角挤压(ECAP)进行严重的塑性变形。通过重复操作,可以将具有高角度晶界的样品的晶粒尺寸从20μm减小到约300 nm。在严重变形期间,样品中会形成很强的质地,这可以通过粘塑性自洽(VPSC)模型进行追溯。据推测,棱柱滑动和机械孪生的组合在严重变形(主要是剪切特性)期间起作用。通过光学显微镜和蒙特卡洛计算机模拟研究了严重变形的样品的晶粒生长动力学,结果表明晶粒生长指数n为0.25至0.44。对于计算机仿真,开发了一种直接映射方法,以便将通过电子背散射衍射(EBSD)获得的取向图像图(OIM)进行数字化处理,并植入到仿真微结构网格中。晶粒生长可以被描述为正常生长,伴随着边界取向错误角度的不变分布特征和纹理的顽固性状。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号