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Residual resistivity ratio and plasticity of high-purity NiAl single crystals

机译:高纯度NiAl单晶的残余电阻率和可塑性

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High-purity NiAl single crystals have been prepared by crucible-free inductive zone melting under an Ar atmosphere. The influence of an annealing treatment (1073 K for 24 h) on the residual resistivity ratio and on the plasticity was studied for these samples. For stoichiometric single crystals the residual resistivity ratio increases a factor of about two to three during the annealing treatment and the annealed specimens show a higher ductility. Both improvements can be explained by the formation of vacancy clusters during the annealing treatment as observed by transmission electron microscopy investigations.
机译:高纯NiAl单晶是通过在Ar气氛下通过无坩埚感应区熔化制备的。对于这些样品,研究了退火处理(1073 K,持续24 h)对残余电阻率比和可塑性的影响。对于化学计量的单晶,在退火处理期间,残余电阻率比增加了大约2到3倍,并且退火后的样品显示出更高的延展性。透射电子显微镜研究观察到,这两种改进都可以通过退火处理过程中空位簇的形成来解释。

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